3D Printing
| Basic 3D printing printers with high volume pinting capabilties
| FDM 3D printing
| Architecture recources center - TCOM Digital Lab
| Yair Rahabi |
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Alox Oxidation Furnace
| Low temp wet oxidation
| Fab
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Atomic Force Microscope
| Asylum Research / Oxford Instruments MFP-3D Infinity
| Atomic Force Microscopy
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Atomic Force Microscope (DI-3000)
| | Atomic Force Microscopy
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Automatic Coater (Suss MicroTec Delta 80 RC)
| Photolithography coating
| Photolithography
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Automatic Developer (Suss MicroTec Delta 8+)
| Photolithography developing
| Photolithography
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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C-V Plotter (MDC)
| | C-V measurement
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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CDs Optical Measurements
| CDs Optical Measurements (Vickers micro-system)
| Dimension measurement
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Contact Angle Goniometer
| Contact Angle Goniometer
| Contact angle measurement
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Contact Mask Aligner (KARL SUSS MA-6)
| Photolithography exposer
| Photolithography
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Contact Mask Aligner with BSA (KARL SUSS MJB3)
| Photolithography exposer
| Photolithography
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Dicer (Disco DAD3350)
| | Dicing
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Dry Film Laminator (JSE JSL-1200)
| Photolithography film laminator
| Photolithography
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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E-beam Evaporator (Airco Temescal BJD 1800)
| | Evaporator
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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E-beam Evaporator (Airco Temescal FC 1800)
| | Evaporator
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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E-beam Evaporator (Evatec BAK-501A)
| | Evaporator
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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E-beam Evaporator (VST TFDS-184)
| | Evaporator
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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E-Beam Lithography (Raith EBPG 5200)
| | Nano e-beam lithography
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Ellipsometer Multi-layer measurements
| Wave length 193-2500nm
| Film thickness and refractive index measurement
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Film stress measurement (Tencor FLX-2320)
| | Film stress measurement
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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HR-SEM (Hitachi S-4800)
| | Scanning electron microscopy
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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HR-SEM (Tescan Clara)
| Low currents, Decel mode
| Scanning electron microscopy
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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ICP Deep RIE (Plasma-Therm Versaline
| Plasma dry etch for deep Si etch, (Fluorine Chemistry)
| Plasma dry
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Laser Lithography System
| Photolithography exposer and mask preparation (Heidelberg Instruments DWL 66+)
| Photolithography
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Molecular Vapor Deposition (AMTS 100E)
| | Film deposition
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Plasma Asher (Axic HF-8)
| Plasma clean
| Plasma clean
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Plasma Asher (YES G-1000)
| Plasma clean
| Plasma clean
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Plasma-Assisted Atomic Layer Deposition
| Ultratech/ Cambridge Nanotech Fiji G2
| Film deposition
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Rapid Thermal Annealing (JetFirst 200HT)
| | Thermal annealing
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Reactive Ion Etching (RIE Plasma Therm 790)
| Plasma dry etch
| Plasma dry
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Surface Profiler (KLA Tencor 200)
| | Surface profiler
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Surface Profiler (KLA Tencor 500)
| | Surface profiler
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Surface Profiler (KLA Tencor P-6)
| | Surface profiler
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Thermal Evaporator (Vinci PVD-4)
| | Evaporator
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Tube Furnaces for annealing
| Tube Furnaces for annealing (BTI-Bruce RTRI-878)
| Thermal annealing
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Tube Furnaces for Dry Oxidation
| Tube Furnaces for Dry Oxidation (BTI-Bruce RTRI-878)
| Dry oxidation
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Tube Furnaces for Poly-Si deposition
| Tube Furnaces for Poly-Si deposition (BTI-Bruce RTRI-878)
| Poly-Si film deposition
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Viscometer (Viscotech Myr VR 3000)
| | Viscometer
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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Wire Bonder (TPT HB16)
| | Wire bonding
| MNFU - Micro-Nanoelectronics Fabrication Unit
| Yana Milyutin |
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HRTEM - FEI Titan Cubed Themis G2 60-300
| Double corrected, Monochromated, EDS, EELS, In-situ holders, 4D-STEM
| Transmission electron microscopy
| EMC - The Electron Microscopy Center
| Yaron Kauffmann |
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Olympus BX51 Light Microscope
| light microscopewith a CCD camera
| Light Microscope
| EMC - The Electron Microscopy Center
| Yaron Kauffmann |
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TEM - FEI Tecnai G2 T20 S-Twin TEM
| EDS, STEM
| Transmission electron microscopy
| EMC - The Electron Microscopy Center
| Yaron Kauffmann |
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Leica GP2
| Cryo-TEM specimen preparation under controlled conditions
| Cryo-TEM specimen preparation
| Technion Center for Electron Microscopy of Soft Matter
| Zipora Lansky |
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Instron 1342 (Hydraulic )
| 10kN, 20Hz, +\- 60 mm
| Tensile machine
| The Materials Mechanics Center
| Ziv keren | | |
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Instron 4483 (Screw Driven )
| 150kN, +\- 2m
| Tensile machine
| The Materials Mechanics Center
| Ziv keren | | |
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Instron E10K (electric)
| linear: 10kN,100Hz, +\- 30mm; Torsion: 100Nm,100Hz, +\- 135o rotation
| Tensile machine
| The Materials Mechanics Center
| Ziv keren | | |
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MTS 656 (Hydraulic )
| 250kN, 25Hz, +\- 75mm
| Tensile machine
| The Materials Mechanics Center
| Ziv keren | | |
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